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Polysilicon production laboratory

2008-08-05View Original

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Who knows: What equipment is there in the laboratories/analysis rooms of polysilicon production plants? Do we need to analyze and test all those materials?
Reply #22008-08-10
Friend, there are many things here, and most of them need to be bought from abroad
Reply #32008-08-11
Equipment such as GC, ICP, ICP-MS, AAS, and conventional instruments
Reply #42008-08-11
GC with TCD is used to analyze SIHCl3, SiCl4, H2, and DCS in the materials used for synthesizing trichlorosilane. Metal impurities in trichlorosilane are detected using ICP and ICP-MS, while non-metallic impurities as well as the carbon content are determined using an infrared spectrometer at room temperature
Reply #52008-09-04
What do GC’s TCD, ICP, and ICP-MS mean?
Reply #62008-09-04
The TCD of GC is a gas-phase thermocouple detector; ICP generally refers to inductively coupled plasma emission spectroscopy, namely ICP-AES or ICP-OES (direct reading spectrometry); it can also refer to inductively coupled plasma. Generally, measurements are taken at the ppm level. ICP-MS stands for inductively coupled plasma mass spectrometry, and it can detect trace elements at the ppb or even ppt levels
Reply #72008-09-15
Hehe, this is a top-level technical secret
Reply #82009-12-27
Good material, I’ve learned from it. Thank you for sharing
Reply #92010-02-26
Who will come and discuss the physical testing of polysilicon using the zone melting PB method?

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