High-purity hydrochloric acid standard for HCL synthesis
Thread Content
High-purity hydrochloric acid is required for HCL synthesis. Are there any special requirements for high-purity hydrochloric acid in the polysilicon production process?
The synthesis of SiHCl3 uses HCl produced by the reaction of H2 and Cl2; high-purity hydrochloric acid is not utilized. Hydrochloric acid is a by-product obtained after separating the gases resulting from the reduction of polysilicon, and there are processes for separating it to produce acid
First, meteorological HCL needs to be synthesized, and from HCL, TCS is then synthesized; hydrochloric acid is used in the synthesis of HCL. What I’m asking about is the high-purity hydrochloric acid used here – are there any specific requirements regarding it?
Just use H2 and CL2 to produce gaseous HCl, right? For HCL, it is sufficient to achieve the designed purity! Moreover, a large proportion of HCL comes from recycling! I would like to ask why high-purity hydrochloric acid is used?
In other words, for the subsequent processes such as TCS synthesis, which elements here should we control? Is it all caused by metal impurities?