Do chlor-alkali plants still have CIO removal equipment in the secondary brine section nowadays?
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This post was last edited by sunjl1981 on 2013-1-7 00:23. I mean, is it still necessary to use NaSO3 to remove CIO-? CIO – does it mainly have a corrosive effect on carbon tube filters? What is the impact on chelating resins? Thank you. # hcbbs
Materials containing free chlorine are not allowed to enter the filter; free chlorine reduces the strength of the sintered tubes as well as their filtering efficiency. When it enters the resin tower, it can poison the resin and prevent it from performing ion exchange functions. In severe cases, the ion resin loses its ability to carry out ion exchange permanently and cannot be restored to normal function. If the brine contains free chlorine, adding sodium hypochlorite to the brine storage tank can be an option, provided that the brine pipelines are made of acid- and oxidation-resistant materials
Saline water containing CIO- entering the resin tower can poison the resin, causing it to lose its ion-exchange capacity; in severe cases, the ion resin may permanently lose this ability. Additionally, CIO- has oxidizing properties, and when the resin is oxidized, its strength decreases, making it more prone to breaking and reducing its ability to absorb metal ions. Therefore, it is essential to prevent saline water containing CIO- from reaching the resin tower, and Na2SO3 should be used to remove CIO after the primary saline water filter-
Saline water containing CIO- entering the resin tower can poison the resin, causing it to lose its ion-exchange capacity; in severe cases, the ion resin may permanently lose this ability. Additionally, CIO- has oxidizing properties, and when the resin is oxidized, its strength decreases, making it more prone to breaking and reducing its ability to absorb metal ions. Therefore, it is essential to prevent saline water containing CIO- from reaching the resin tower, and Na2SO3 should be used to remove CIO after the primary saline water filter-
Free chlorine will oxidize the resin, causing it to become poisoned and break down. Here, we add sodium sulfite in the flow deflection tank before entering the brine tank.
Oh, I wonder if removing the CIO is in the brine purification section? Is it still the secondary brine purification section?
In the current brine process, acid and sodium sulfite are added before the brine is introduced into the tank, in order to adjust the excess alkalinity and remove free chlorine
In our factory, the primary brine and the secondary brine are handled in the same processing section; what do you think?
CIO- comes from the electrolysis of secondary brine to produce fresh water; before it is returned to the primary brine, it is first alkalized, and a certain amount of Na2SO3 is added for removal. What remains needs to be further removed from the primary brine. The timing of this removal depends on the process, but in any case, it should not be detectable when it enters the resin tower. Last edited by TF123 on 2009-4-25 00:15.]
It is essential to have equipment for monitoring free chlorine levels, and this is very important. Many companies these days do not pay enough attention to controlling free chlorine, thinking that a level of 5 is sufficient; however, design and technical requirements specify that the level should be 0. The reasons for this have been explained by those who spoke earlier, so there is no need to repeat them here. Additionally, when resins are exposed to free chlorine over an extended period, the amount of resin that needs to be replenished each year increases, and the lifespan of the resins is significantly reduced. Generally, after replenishment, chelating resins should be gradually replaced with new ones. Yet in reality, most companies replace such resins completely every 3–4 years – and that is the cost involved. I hope that everyone will take responsibility for both the company and themselves by paying close attention to controlling this parameter.