Requirements for synthesizing chlorine from trichlorosilane
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Our company uses trichlorosilane in conjunction with ion-exchange membrane caustic soda production; chlorine is supplied directly for the synthesis of hydrogen chloride using a chlorine pump. However, the water content in the HCl produced is too high, and deep cooling alone is not sufficient to meet the requirements. How can this be improved? I don’t want to use liquid chlorine cylinders to supply chlorine; it’s too troublesome.
Is it the high water content in chlorine that causes the high water content in hydrogen chloride? If so, a way needs to be found to dry the chlorine gas.
First, analyze and determine whether it is due to moisture in chlorine or high moisture content in hydrogen; if additional drying equipment is needed, install it after the synthesis furnace if everything is operating normally.
Mainly, chlorine contains a high amount of oxygen; there’s probably no device for removing oxygen from chlorine. Moreover, deep-cold dehydration of hydrogen chloride doesn’t achieve the desired results
After HCL synthesis, it can be dehydrated using silicon tetrachloride
It is possible to consider drying the hydrogen chloride after its synthesis; there are already manufacturers in China that do this
Could you be more specific about the 5th floor? Down to what ppm can it be reduced?
The purity should be at least 99.9%
The water produced by the equipment we are using now has a moisture content of less than 50 ppm
The synthesized hydrogen chloride can be dehydrated
The purity of chlorine gas should be no less than 96% (by volume), while that of liquid chlorine should be over 99.5%； The moisture content is below 0.03%, and the hydrogen content is below 0.4%.