Heating of silicon trichlorohydride synthesis furnace

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The synthesis furnace uses jacketed water cooling; nitrogen is heated by electric heaters (up to 500 degrees Celsius), and the hot nitrogen is then used to raise the temperature of the synthesis furnace. I have many questions: 1. Should the heating rate of the synthesis furnace be controlled? If so, what is an appropriate temperature increase per hour? And how can this heating rate be controlled? For a device, how many hours should pass before the temperature rises to 400 degrees? 2 Before heating up, a certain amount of silicon powder must be added to the synthesis furnace. Does the silicon powder inside this furnace have to be fluidized right at the start of heating? If fluidization is necessary, then the amount of nitrogen required would be far too large. If it doesn’t become fluidized, I’m not sure whether the temperature in this synthesis furnace can be raised evenly throughout 3 I have just entered the polysilicon industry and have no experience. I’m not sure if the temperature will fail to reach the over 300 degrees Celsius I need What should be done if it really isn’t possible to rise up? I hope those with experience in this area can share their opinions