What is the effect of HCL concentration and moisture on SiHCl3 synthesis?
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This post was last edited by zjiris on 2009-9-17 at 19:38. What effects do low HCL concentration and high moisture content have on the synthesis of trichlorosilane?
A too low concentration of hydrogen chloride results in low purity of the trichlorosilane produced in the reaction, and this is beyond doubt. Excess moisture can easily cause blockages in the system, and this has always been a major problem that has not been resolved. It also leads to a decrease in yield, and the printing plates on the equipment wear out very quickly.
It will affect the conversion rate of silicon powder, cause blockages in the subsequent condensation system, and also damage the equipment
With high moisture content, hydrogen chloride easily forms hydrochloric acid, causing corrosion to the equipment. The hydrogen chloride concentration is low; in other words, the amount of hydrogen chloride is relatively small, which affects the conversion rate, resulting in a low conversion rate!
An excessively high HCL concentration will dilute the concentration of trichlorosilane, reducing the likelihood of collisions between trichlorosilane and silicon rods; this in turn lowers the rate of silicon deposition and reduces the yield. Excessive moisture, on the other hand, will cause trichlorosilane to hydrolyze. The acid produced by this hydrolysis will corrode the equipment, while the silica gel formed as a result will block the equipment’s pipelines, disrupting production.