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This post was last edited by zjiris on 2009-12-23 19:13. I read a post about hydrogenation "SiCl4 conversion reaction at a temperature of 400~500℃ and a pressure of 1.3~1.5Mpa". Please discuss whether the operating conditions are feasible.
If the pressure is higher, it means cold hydrogenation.
For thermal hydrogenation, the temperature is 1600 degrees
The thermal hydrogenation temperature is above 1100 degrees, the low-temperature hydrogenation temperature is about 500 degrees, and the pressure is about 15 kg.
Does low-temperature hydrogenation also use graphite rods?
It is said that the thermal hydrogenation temperature is above 1250 degrees and the pressure is about 6 kg. Can anyone give authoritative parameters?
Three years ago, Xinguang used LS conditions for thermal hydrogenation, but now the temperature has dropped. According to 1250 degrees, silicon is quickly deposited on the graphite heating element, and then it is easy to burn out the equipment when it is discharged and ignited. In addition, it is said that the pressure has continued to increase. Although pressurization is not conducive to the balance of the reaction, the concentration has increased and the speed is faster.
1600 degrees is too high. I think 1100-1400 is more suitable. Please check the test results for details.
The poster mentioned are parameters for cold hydrogenation, but if a suitable catalyst is used, the temperature can be reduced to about 400 degrees and the pressure can be reduced to about 12Kg.
Cold hydrogenation is when silicon tetrachloride, hydrogen, silicon powder and catalyst are converted into trichlorosilane under a certain temperature and pressure without graphite rods.