Dichlorosilane

Activity is the degree of disorder of a substance, represented by entropy. According to the third law of thermodynamics, lowering the temperature can reduce the activity of a substance. http://webbook.nist.gov/chemistry/ This is a good website for checking properties, you can check it out

DCS is actually a better seed. In CVD, especially in the early stage, it has a relatively large effect on the deposition rate of silicon. Secondly, adding a certain amount of DCS to CVD can also reduce the temperature of the furnace wall and achieve a certain energy-saving effect. However, there are two problems currently faced.: 1. The deposition of DCS in CVD may cause dispersion and cause the risk of clogging. ； 2. Impurities in DCS will affect the quality of the product. Solution: 1. In the early stage, the temperature in the furnace is lowered to maintain the silicon core so that it can be deposited on the silicon core. Of course, this requires adjustment and optimization of the control system and feeding system. 2. Since the boiling points of B3H6 and DCS are very close, it is impossible to separate them by conventional distillation. Therefore, the B content in DCS is a key. Impurities can be removed by adsorption separation. Of course, the selection and specific operation of the adsorbent will not be discussed here. Passing the impurity-removed DCS into CVD is a subject worth trying for the polysilicon industry. This is just a starting point!

DCS needs to be stored at low temperature. When the pressure is too high, thank you appropriately.