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Several concepts related to the deposition of polysilicon in a reduction furnace: deposition speed, deposition rate, and radial average speed – what are the differences between them?
Deposition rate refers to the weight of silicon deposited per unit time during the reduction reaction. The so-called deposition rate refers to the amount of silicon deposited per unit time and per unit length of the carrier in the reduction reaction ; That is, from start to end, the average radial growth length of the silicon rod per hour.
The radial average velocity is the diameter of the silicon rod at the start of feeding divided by the diameter obtained at the end of production, all divided by the production time
Reply to 3# dwj119110dwj: The third line (the third sentence) refers to the radial growth rate
Reply to 4# Qingheying: Actually, my own opinion is that the radial growth rate – that is, the average radial length increase of the silicon rod per hour from start to end – is equal to the increase in thickness, which is the difference in growth radii divided by t. Who decided on the diameter difference/t? ? ?
Reply to 6# jesscy: The original poster is asking about the radial average velocity, not the speed.
Reply to 7# Qinghe Ying: That speed should have a direction; there is no such thing as a rate. That’s why I think it should be the thickness growing radially – the difference in radius over ta