Is the trichlorosilane synthesis furnace damaged?
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Why do the nozzles of the synthesis furnace get damaged even when there is no excess chlorine in HCL? Do you know what causes this? Please advise!
It’s not due to perchlorine; it’s because the silicon powder you used wasn’t dried properly, and its moisture content was too high. It’s also possible that the silicon powder is not evenly distributed on the distribution plate, resulting in localized overheating; the impact of this situation is relatively minor.
I agree with the above statement; it’s also possible that the HCl contains a high level of moisture
I personally think it’s caused by low HCL traffic
Reply to 2# qhzhgod: Local overheating is possible, but my HCL flux is high enough, so it shouldn’t boil; moreover, the purity of the synthesis liquid can still reach 80–85%.
Reply to 3# Luo Shui Chang Liu: There is definitely no issue with the moisture content of HCL, as the dew point of my feed gas is very good; since the plant started operating, there has been no occurrence of condensed acid in the HCL synthesis furnace.
Hydrogen also contains a certain amount of moisture. Additionally, there are residual gases in the furnace after it is stopped; when these gases cool down, acids are formed that remain inside the lamp head, and this can cause damage to the lamp head when the lamp is turned on and heated up
Hydrogen also contains a certain amount of moisture. Additionally, there are residual gases in the furnace after it is stopped; when these gases cool down, acids are formed that remain inside the lamp head, and this can cause damage to the lamp head when the lamp is turned on and heated up
Reply to 8# Tan Yin: I’m referring to the nozzle of the trichlorosilane synthesis furnace being damaged; it’s not the HCl synthesis furnace. Moreover, even if there is condensed acid, it should not cause damage to the lamp head. Our condensed acid is generated only when hydrogen and oxygen burn during operation, and we keep the concentration of our raw gas at below 100PPM.
1. Perchloroform combustion 2. Low flow rate 3. Material issue
It is not caused by perchlorine; rather, it results from high moisture content in the silicon powder, high moisture content in hydrogen chloride, low gas flow rate, or an inadequate hydrogen chloride distributor, which prevents the silicon powder from flowing and leads to localized overheating.