Who knows the process flow for wet dust removal of trichlorosilane?
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This post was last edited by *ng*ng916 on 2011-11-24 at 13:14. I would appreciate it if experts could provide guidance on the wet dust removal process for trichlorosilane
Among the considerations, anti-clogging design is the most important
This technology is actually quite simple: it involves using two stages of washing to remove some of the impurities, then a stripping tower is used, and finally condensation completes the process
Currently, the synthesis of trichlorosilane is less common. Wet dust removal is generally used in cold hydrogenation processes.
A technical upgrade was carried out not long ago, with wet dust removal being used, and the results so far are quite good! I’m paying attention to the potential issues!
Anti-clogging designs are also encountered in cold hydrogenation, so please pay close attention
Could you be more specific about wet dust removal?
Wet dust removal is employed, using the condensate from the trichlorosilane intermediate tank to wash the process gas.