Thread Content
The last edit to this post was made by hesonchang214 on 2020-3-24 at 10:32. The water quality of the feed water for semiconductor ultra-pure water treatment equipment is subject to very high requirements on the part of the EDI module. The conductivity of the water entering the ultra-pure water treatment equipment is an important factor affecting the quality of that water. To ensure that the EDI modules receive high-quality water, it is necessary to keep the conductivity of the water after pre-treatment at less than 40 μs/cm; such water quality helps to achieve effective removal of impurities. The water entering the module should not contain excessive carbon dioxide; therefore, it is necessary to remove as much carbon dioxide as possible from the water entering the equipment. The method for removing carbon dioxide is primarily by adjusting the pH level during the pretreatment stage. Semiconductor ultra-pure water equipment also has certain requirements regarding the hardness of the incoming water. Controlling this hardness is quite simple; softening the water before it enters the system, while simultaneously removing carbon dioxide, is sufficient. When the salt content in the water entering the module exceeds a certain level, an additional reverse osmosis system or nanofiltration system can be used in combination with desalination processes. The TOC level of the water entering the semiconductor ultra-pure water treatment equipment must also remain within the specified range. TOC refers to the total amount of organic substances in the water, and TOC can be reduced by adding an additional reverse osmosis system. In addition to the factors mentioned above, indicators such as the turbidity of the incoming water are essential requirements.