Roughness ranges for different polishing methods

The roughness range of the polishing method mainly depends on various factors such as the polishing material, polishing process, and equipment. The following are the general roughness ranges for three polishing methods: 1. Mechanical polishing: This is a method that removes tiny protrusions on the surface of the material through physical friction, allowing the roughness to be reduced to around Ra 0.1μm, or even lower. 2. Chemical polishing: Chemical polishing is a method that uses chemical reactions to remove material from the surface; the roughness can be reduced to between Ra 0.01μm and 0.1μm, depending on the type of material and the chemical solution used. 3. Electrolytic polishing: Electrolytic polishing is a method of improving surface roughness by anodically dissolving the material; it can reduce the roughness to between Ra 0.01μm and 0.1μm. It should be noted that the values mentioned above are for reference only; the actual roughness level needs to be adjusted according to the specific materials and operating conditions. .

Polishing is a complex process; the smoothness achieved through polishing depends on the material of the workpiece itself, as well as on the polishing techniques and the polishing medium used. In general industrial applications, a polishing finish of 0.1 um already results in a very smooth surface; however, for certain precision optical components and parts used in microelectronics manufacturing, a finish of at least 0.01 um, or even higher, is required – such as in the exposure platforms of lithography machines and the lenses of large optical telescopes.