Introduction to the standards for ultra-pure water used in semiconductor cleaning and the characteristics of production equipment

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This post was last edited by hesonchang214 on 2019-11-7 07:15. Standards for ultrapure water used in semiconductor cleaning. There are many standards regarding the quality of water produced by ultrapure water equipment, and the purity level of water required in the production processes of different companies also varies. The semiconductor industry must comply with the relevant standards of China’s electronics industry, as well as meet certain foreign water quality standards. It also meets the American ASTM standards as well as those of Germany, Japan, and other countries; moreover, the water quality remains stable, preventing secondary pollution. 　　Features of ultra-pure water production equipment for semiconductor cleaning The development of electronic technology has a significant impact on people’s daily lives, and the semiconductor industry, which is essential in this context, is receiving increasing attention. The RO membranes used in ultra-pure water equipment for semiconductor cleaning have pore sizes on the nanoscale, and dual-stage reverse osmosis is employed to meet **the standards for grade 1 laboratory water.