The necessity of polishing the buffer tank and crystallizer in crystalization units
Thread Content
I would like to ask the experienced professionals in crystallization: what is the reason for the polishing requirements for the buffer tanks and crystallizers in crystallization systems?
If the crystallizer needs polishing, does the pipeline not need polishing as well? Is it still only required to polish devices that remain in use for a longer period of time?
Equipment generally requires polishing, which in simpler terms means mirror polishing; the target surface finish is usually Ra0.6. Mechanical polishing is often used to achieve this level of polish required by standards. Electrochemical polishing is rather troublesome, especially for large-volume equipment, and not every manufacturing plant has the necessary equipment for this process.
Thank you! The concept of mirror polishing seems a bit vague. I asked several manufacturers, and they mentioned polishing levels ranging from 5 to 10. Isn’t there any fixed standard in the crystal industry for this? Also, should it be Ra0.6 or Ra0.06?
0.6 I guess; 0.06 is an extremely high value. The unit of length is micrometers, μm
Generally, crystallization tanks are polished to prevent materials from sticking to the walls.
Thank you all for your replies. I think that simply preventing the materials from getting stuck is sufficient; there’s probably no real need to polish them to level 10.