Signing of Nagase Wuxi’s 35,000-ton high-purity electronic chemicals project

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On March 25, the Nagase Wuxi High-Purity Semiconductor Materials Manufacturing Facility project, with a registered capital of $30 million, was officially signed in Wuxi and established in the Xishan New Materials Industrial Park. The project was developed jointly by Nagaise Industry Co., Ltd. of Japan and its wholly-owned subsidiary Nagaise SaiChuang (Wuxi) New Materials Co., Ltd. The project requires approximately 70 mu of land and is located in the Xishan New Materials Industrial Park; it is designed to produce 35,000 tons per year of high-purity electronic chemicals such as TMAH (developing solution). The project is scheduled to start construction in August 2026 and come online in January 2028; upon reaching full capacity, it is expected to generate annual sales of 500 million yuan and tax revenues of 35 million yuan. Future projects will build on Nagase’s expertise in the semiconductor industry to further expand the range of products produced at this facility, turning it into Nagase’s main R&D and production base for electronic chemicals in China. At the event, the project for a high-purity semiconductor material manufacturing facility in Nagase and a memorandum of understanding for industrial collaboration among the four parties were signed.