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Burners are primarily used to melt glass raw materials and shape glass. By generating a high-temperature flame, the burner enables efficient glass production; meanwhile, its precise temperature control function ensures high-quality glass and reduces defects during the production process. Furthermore, high-temperature flames can also be used for glass shaping to create glass products of various shapes. At the beginning of the accumulation of glass microparticles, a gas formed by mixing an inert gas into the oxidizing gas is supplied to the oxidizing gas discharge port ； While increasing the flow rate of the oxidizing gas supplied to the oxidizing gas outlet port, reduce the flow rate of the inert gas supplied to the oxidizing gas outlet port. Glass burners can increase the heating power for flame processing without unnecessarily increasing the flow rate of the combustion gases; they can also improve the efficiency of depositing glass particles on porous glass preforms. The main advantages of industrial burners lie in their high efficiency, high quality, and high level of controllability. A continuously stable high-temperature flame improves production efficiency; precise temperature control ensures the quality of the glass, while the automatic control system allows the flame temperature to be adjusted accurately according to various production requirements. Generally, the gas flow rate in common burners is difficult to control, which makes their use unsafe. However, by installing a suitable flow control valve on the flow sensor, this problem can be effectively resolved, resulting in a stable gas supply flow, improved ignition efficiency, and enhanced safety during the ignition process. A gas flow control device from Gongcai Network – the American SIARGO mass flow controller MFC2000 – can be used for controlling the intensity of combustion in glass processing burners, thereby enabling effective control of the flame in such burners. The gas mass flow controller MFC2000 utilizes the company’s proprietary MEMS Thermal-D operation technology, which combines heat sensing capabilities with intelligent control electronics. This unique mass flow sensing technology eliminates the gas sensitivity issues associated with gases that have similar diffusion rates, and it enables gas identification after programming. This product can be used for process control with a dynamic range of 100:1, covering pressure ranges from 0.1 to 0.8 MPa (15 to 120 PSL) and compensation temperatures from 0 to 50°C. The flow rate range can be selected from 50 mL/min to 200 L/min, and it features digital RS485 Modbus communication as well as an analog output. The design of this product facilitates the replacement of mechanical connectors; standard connectors can be double ferrule, VCR, or UNF types, while other custom connectors are available upon request. SIARGO’s MFC2000 flow controller plays a vital role in CVD devices; it enables precise measurement and control of gas flow, thus facilitating high-temperature, high-precision, and high-resolution film deposition processes.