How should silicon contamination in resin be dealt with?
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How should silicon contamination in resin be dealt with?
Silicon compound contamination occurs in strong alkali anion exchangers, especially in equipment and systems that use a combination of strong and weak-type anion resins, and this often results in a decrease in the silicon removal efficiency of the anion exchanger. The reason for this contamination is insufficient regeneration, or failure to regenerate in a timely manner after the resin becomes ineffective. The treatment method involves soaking it in a dilute, warm alkaline solution to dissolve it. The alkali solution concentration is 2%, and the temperature is around 40 degrees. When pollution is severe, a heated 4% sodium hydroxide solution can be used for cyclic cleaning.
Regeneration and washing using a 4%–8% NaOH solution at 40–50°C can minimize the colloidal silica content in strongly basic anion exchange resins.