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This post was last edited by Zaihui Kangqiao on 2016-6-27 at 14:15. The Chemical Engineering Theory section is now launching a \"One Question per Day\" activity to help everyone reinforce their basic knowledge in chemical engineering. Subsequent series such as \"Chemical Engineering Principles\", \"Mass Transfer and Separation\", \"Chemical Engineering Thermodynamics\", and \"Chemical Engineering Processes\" will be introduced as well; we hope for your active support~~~ Answers to the questions in the \"One Question per Day\" activity can be viewed directly, and the thread will be closed after 1 day! ! To encourage continued participation from everyone this year! You get 3 wealth points for participating, and an additional 4 wealth points for answering correctly~~~ Short answer question: What is the main cause of silicon compound contamination in strong-base anion exchangers?
Inadequate regeneration and failure to regenerate in a timely manner after the resin became ineffective.
It is due to insufficient regeneration, or failure to regenerate in a timely manner after the resin becomes ineffective.
Silicon substances polymerize and get adsorbed on the resin
Insufficient regeneration and failure to regenerate in a timely manner after the resin fails
Insufficient regeneration and failure to regenerate in a timely manner after the resin fails
Insufficient regeneration and failure to regenerate in a timely manner after the resin becomes ineffective
Insufficient regeneration and failure to regenerate in a timely manner after the resin fails
Insufficient regeneration and failure to regenerate in a timely manner after the resin becomes ineffective
Insufficient regeneration and failure to regenerate in a timely manner after the resin fails
The high content of soluble silicon in water, especially colloidal silicon, causes sodium silicate colloids to form during the regeneration process of the resin, making it difficult to remove them.