Introduction to the manufacturing process of semiconductor ultra-pure water equipment

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　　1. Pre-treatment system → Reverse osmosis system → Intermediate water tank → Coarse mixing bed → Fine mixing bed → Pure water tank → Pure water pump → Ultraviolet sterilizer → Polishing mixing bed → Precision filter → Water usage point (≥18MΩ.CM) (Traditional process)
2. Pre-treatment → Reverse osmosis → Intermediate water tank → Water pump → EDI unit → Purification water tank → Pure water pump → Ultraviolet sterilizer → Polishing mixing bed → 0.2 or 0.5μm precision filter → Water usage point (≥18MΩ.CM) (New process)
3. Pre-treatment → First-stage reverse osmosis → Chemical dosing machine (pH adjustment) → Intermediate water tank → Second-stage reverse osmosis (positively charged reverse osmosis membrane) → Pure water tank → Pure water pump → EDI unit → Ultraviolet sterilizer → 0.2 or 0.5μm precision filter → Water usage point (≥17MΩ.CM) (New process)
4. Pre-treatment → Reverse osmosis → Intermediate water tank → Water pump → EDI unit → Pure water tank → Pure water pump → Ultraviolet sterilizer → 0.2 or 0.5μm precision filter → Water usage point (≥15MΩ.CM) (New process)
5. Pre-treatment system → Reverse osmosis system → Intermediate water tank → Pure water pump → Coarse mixing bed → Fine mixing bed → Ultraviolet sterilizer → Precision filter → Water usage point (≥15MΩ.CM) (Traditional process)