Guizhou Phosphorus and Fluorosilicon Technology obtains patent for chlorine-containing hydrogen fluoride separation system

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Guizhou Phosphorus Fluorosilicon Technology has obtained a patent for a hydrogen chloride-containing hydrogen fluoride separation system. According to information from the Intellectual Property Office, Guizhou Phosphorus Fluorosilicon Technology Co., Ltd. has been granted a patent titled “A Separation System for Hydrogen Chloride-Containing Hydrogen Fluoride,” with the approval number CN223096487U; the application was filed in July 2024. The patent abstract indicates that this application falls within the field of chemical production equipment technology, and it specifically discloses a separation system for hydrogen chloride and hydrogen fluoride. This system includes a condensation tower and an absorption separation tower connected in sequence. The absorption separation unit comprises a tower body, within which a distribution tray and a packing section are arranged from top to bottom. The upper end of the tower body is equipped with a liquid inlet and an exhaust gas outlet, while the lower end has a liquid outlet and an air inlet. Both the air inlet and the liquid inlet are located along the radial direction of the tower body, whereas the liquid outlet and the exhaust gas outlet are located along the axial direction of the tower body ； Dilute sulfuric acid is introduced into the liquid inlet. The purpose of this patent is to address the issue in existing hydrofluoric acid production systems based on the fluorosilicic acid method, where the absorption and separation efficiency of chloride ions from the fluorosilicic acid in the separation system is not satisfactory.